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buja said:..............do you use long nap to remove the initial cured wax coating, then short nap for final buffing ? or is it the other way round ?
+1 to what Setec says. On a general purpose MF (short nap on one side and a long nap on the other) use the shorter nap to cut the initial wax/polish residue and the longer nap for final buffing.Setec Astronomy said:...................the short nap to cut the residue, than the long for the final buffing and dust removal.